Regensburg 2010 – wissenschaftliches Programm

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O: Fachverband Oberflächenphysik

O 58: Surface chemical reactions II

Mittwoch, 24. März 2010, 15:00–17:30, H42

15:00 O 58.1 Photoinduced substrate-mediated N2O reduction on MgO/Ag(001) surfaces — •Harald Kirsch, Philipp Giese, Christian Frischkorn, and Martin Wolf
15:15 O 58.2 Single-molecule synthesis and characterization of metal ligand complexes by low-temperature STM — •Ingmar Swart, Peter Liljeroth, Sami Paavilainen, Jascha Repp, and Gerhard Meyer
15:30 O 58.3 Oxidation of CO over RuO2(110): a Reflection-Absorption IR Spectroscopy study — •Attila Farkas, Georg Christoph Mellau, and Herbert Over
15:45 O 58.4 High pressure XPS on supported planar model and powder Au/TiO2 catalysts in the presence of reactive gases — •Joachim Bansmann, Yvonne Denkwitz, Stefan Kielbassa, Birgit Schumacher, R. Jürgen Behm, Peter Schnörch, Elaine Vass, Michael Hävecker, Axel Knop-Gericke, and Robert Schlögl
16:00 O 58.5 Electronic valence band structure of V2O5 — •Torsten Stemmler, Eric Meyer, and Recardo Manzke
16:15 O 58.6 Reactions of Methanol on pseudomorphic Cu/Ru(0001) and O/Cu/Ru(0001) — •Pawel Gazdzicki and Peter Jakob
16:30 O 58.7 Interaction of methanol with the O-terminated ZnO(000-1) surface — •Lanying Jin, Hengshan Qiu, and Yuemin Wang
16:45 O 58.8 First-principles assessment of UBI-QEP derived rate constants for chemical kinetics — •Matteo Maestri and Karsten Reuter
17:00 O 58.9 Theoretical investigation of the mass-scaling of chemicurrents — •Matthias Timmer and Peter Kratzer
17:15 O 58.10 Structure-Sensitivity in Catalytic Reactions on Ir(210) Surfaces — •Payam Kaghazchi, Wenhua Chen, and Timo Jacob
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