Regensburg 2010 – wissenschaftliches Programm
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O: Fachverband Oberflächenphysik
O 74: Nanostructures at surfaces: Other
O 74.8: Vortrag
Donnerstag, 25. März 2010, 16:45–17:00, H34
Contrast inversion of the h-BN nanomesh on Rh(111) investigated by nc-AFM and KPFM — •Markus Langer1, Sascha Koch1, Shigeki Kawai1, Bartosz Such1, Jorge Lobo-Checa3, Thomas Brugger2, Thomas Greber2, Juerg Osterwalder2, Ernst Meyer1, and Thilo Glatzel1 — 1Department of Physics, University of Basel, Klingelbergstr. 82, 4056 Basel, Switzerland — 2Physik-Institut, Universität Zürich, Winterthurerstrasse 190, 8057 Zürich, Switzerland — 3Centre d'Investigaci'o en Nanoci'encia i Nanotecnologia, CIN2 (CSIC-ICN), Esfera UAB, Campus de Bellaterra, 08193-Barcelona, Spain
Boron-Nitride forms a highly regular, hexagonal, corrugated mono-layer (h-BN nanomesh) on a Rhodium(111) substrate [1,2]. High resolution measurements by non contact atomic force microscopy (nc-AFM) as well as the analysis of the electronic structure by Kelvin probe force microscopy (KPFM) will be shown. A contrast inversion of the topography and the local contact potential difference was observed frequently and will be discussed. Two possible scenarios based on a local deformation of the tip apex or of the nanomesh will be presented and are compared to existing theoretical and experimental work.
[1] S. Berner et al., Angewandte Chemie, Int. Edition 46, 5115 (2007).
[2] R. Laskowski et al., Phys. Rev. Lett. 98, 106802 (2007).