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DS: Fachverband Dünne Schichten
DS 54: Nanoengineered Thin Films
DS 54.1: Talk
Thursday, March 17, 2011, 18:00–18:15, GER 38
Photothermal Laser Processing of thin silicon nanoparticle films: Prospects in photovoltaic applications — •Dennis Behrenberg1,3, Hartmut Wiggers2,3, Steffen Franzka1,3, and Nils Hartmann1,3 — 1Fakultät für Chemie — 2IVG — 3CeNIDE, NETZ, Universität Duisburg-Essen, Universitätsstr. 5, 45141 Essen, Germany
Semiconductor nanoparticles (NPs) show great promise as building blocks in a variety of energy applications including thermoelectrics and photovoltaics [1]. A key step towards functional devices is the development of suitable techniques for the fabrication of NPs-based coatings. Here, photothermal laser processing of thin Si-NPs films on Si substrates is investigated. Si-NPs (d = 45 nm) dispersions are spin-coated on Si substrates yielding films with thicknesses < 0.5 microns. Subsequently, laser processing is carried out with a focused beam of an cw-DPSS-laser at a wavelength of 532 nm and a 1/e spot diameter of about 1.4 microns [2]. Using a focused laser beam allows one to conveniently investigate the dependence of the initiated processes on the laser parameters on a single sample. Generally, laser irradiation results in a local temperature rise. Depending on the ambient environment sintering, melting and oxidation of the NPs takes place. Prospects of photothermal laser procedures in photovoltaic applications are discussed, e.g. targeting back surface doping of solar cells.
[1] R. Lechner, H. Wiggers, A. Ebbers, J. Steiger, M. Brandt, M. Stutzmann, Phys. Stat. Sol. (RRL) 1, No. 6 (2007) 262.
[2] T. Balgar, S. Franzka, N. Hartmann, Appl. Phys. A82 (2006) 689.