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Dresden 2011 – wissenschaftliches Programm

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DS: Fachverband Dünne Schichten

DS 54: Nanoengineered Thin Films

Donnerstag, 17. März 2011, 18:00–19:30, GER 38

18:00 DS 54.1 Photothermal Laser Processing of thin silicon nanoparticle films: Prospects in photovoltaic applications — •Dennis Behrenberg, Hartmut Wiggers, Steffen Franzka, and Nils Hartmann
18:15 DS 54.2 Glancing angle deposited Ge nanorod arrays on Si patterns — •Chinmay Khare, Jens Bauer, Bodo Fuhrmann, Hartmut S Leipner, and Bernd Rauschenbach
18:30 DS 54.3 Novel Plasma Process for the Deposition of Nanocomposites for Plasmonic Applications — •Ralph Schmittgens, Marcus Wolf, Peter Frach, and Gerald Gerlach
18:45 DS 54.4 Vertically contacting ultrathin semiconductor nanomembranes by rolled-up metallic contacts incorporating selective etching techniques. — •Dominic J. Thurmer, Carlos Cesar Bof Bufon, Christoph Deneke, and Oliver G. Schmidt
19:00 DS 54.5 (contribution withdrawn) Sodium engineering in multifunctional NaxCoO2 thin films grown by pulsed laser deposition — •Sandra Hildebrandt, Ingo Fritsch, Dirk Becker, Philipp Komissinskiy, Hanns-Ulrich Habermeier, Wolfram Jaegermann, and Lambert Alff
19:15 DS 54.6 Phase transitions in nano-grained close-packed Pd thin filmsErwin Hüger, •Tomas Kana, and Mojmír Šob
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