Dresden 2011 – wissenschaftliches Programm

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O: Fachverband Oberflächenphysik

O 35: Poster Session I (Scanning probe methods)

O 35.20: Poster

Dienstag, 15. März 2011, 18:30–22:00, P3

Scanning Force Microscopy up to the Millimeter Scale — Alexander Förste^1,2, •Markus Moosmann^1,2, Manuel Rothenberger^1,2, Tobias Meier^1,2, Roland Gröger^1,2, Matthias Barczewski^1,2, Stefan Walheim^1,2, and Thomas Schimmel^1,2 — ¹Institute of Nanotechnology (INT), Karlsruhe Institute of Technology (KIT) Campus North — ²Institute of Applied Physics and DFG-Center for Functional Nanostructures (CFN), Karlsruhe Institute of Technology (KIT) Campus South

Using a novel Scanning Force Microscope (SFM) allowing the so far largest scan range achieved (800 µm x 800 µm), surface topography and properties as well as surface processes were studied in a wide range of length scales from the nanometer scale to the sub-millimeter scale. The resolution of single monolayer steps is demonstrated even at ultra-large scan ranges. As sample systems we investigated 1) structured ultra-thin films made from self-assembled monolayers, 2) thin self-organized polymer blend films structured via phase separation and 3) strongly corrugated surfaces produced by embossing or UV lithography.