Dresden 2011 –
wissenschaftliches Programm
O 56: [DS] Progress in Micro- and Nanopatterning: Techniques and Applications III (Focused Session, jointly with O - Organisers: Graaf, Hartmann)
Mittwoch, 16. März 2011, 15:00–17:00, GER 38
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15:00 |
O 56.1 |
Femtosecond laser induced recrystallization and ablation of hydrogenated amorphous silicon films — •Babak Soleymanzadeh, Christian Strüber, Helmut Stiebig, and Walter Pfeiffer
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15:15 |
O 56.2 |
Photothermal Laser Micro- and Nanoprocessing of Mesoporous Gold — •Lina Schade, Mareike Mathieu, Monika Biener, Juergen Biener, and Nils Hartmann
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15:30 |
O 56.3 |
Photothermal laser patterning of buried polymer interfaces — •Anja Schröter, Steffen Franzka, and Nils Hartmann
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15:45 |
O 56.4 |
Photothermally induced chemical patterning of organic monolayers on oxide-free silicon substrates — •Martin Przyklenk, Benjamin Klingebiel, Luc Scheres, Han Zuilhof, and Nils Hartmann
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16:00 |
O 56.5 |
Pattern transfer on large samples using a sub-aperture reactive ion beam — •André Miessler, Agnes Mill, Jürgen W. Gerlach, and Thomas Arnold
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16:15 |
O 56.6 |
Swift Heavy Ion Beam Shaping Of Sub-Micron Structures — •R. Ferhati, N. Guilliard, T. Weishaar, S. Amirthapandian, M. Fritschke, L. Bischoff, and W. Bolse
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16:30 |
O 56.7 |
Surfactant driven self-organized surface patterns by ion beam erosion — •Hans Hofsäss and Kun Zhang
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16:45 |
O 56.8 |
Dynamics of surfactant induced ripple patterns on Si generated by ion beam erosion — •Kun Zhang, Hans Hofsäss, Hans-Gregor Gehrke, and Oliver Göpfert
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