Kiel 2011 – scientific programme

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PV: Plenarvorträge

PV 3: PV III

Tuesday, March 29, 2011, 08:30–09:15, HS G

	08:30	PV 3.1	Plenary Talk: Plasma modeling as a tool to understand deposition rate loss in high power impulse magnetron sputtering — •Nils Brenning, Daniel Lundin, Michael A. Raadu, Chunqing Huo, and Ulf Helmersson