Berlin 2012 – wissenschaftliches Programm

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DS: Fachverband Dünne Schichten

DS 13: Focused electron beam induced processing for the fabrication of nanostructures II (focused session, jointly with O – Organizers: Huth, Marbach)

DS 13.1: Hauptvortrag

Dienstag, 27. März 2012, 09:30–10:00, H 0111

Free electrons for building nanodevices — •Ivo Utke — Empa, Swiss Federal Laboratories for Materials Science and Technology, Thun, Switzerland

Finely focused electron beams in scanning electron microscopes are routinely used to visualize small nanometer-sized objects. But add chemistry and they give you materials and structures for exciting physics to do at the nanometer scale! When functional gas molecules (metal-carbonyls, siloxanes, biphenyls, etc.) are injected into an electron microscope chamber held at a pressure of 1e-6 mbar or lower, they form adsorbed layers on many substrates. Focused electron beams can interact with these molecular layers, triggering surface reactions that can be used to locally etch or deposit, or to induce intermolecular reactions between the adsorbed molecules. All of these focused electron beam induced processes (FEBIP) can be performed on almost any kind of substrate [1]. This presentation will cover the fundamentals of FEBIP and give a state of the art overview on exciting nanodevices realized in the fields nanoelectronics, nanomechanics, nanophotonics, and nano(bio)sensors. Special attention will be given to FEBIP with two molecules involved, which led to the development of high performance magnetic sensors [2] having applications in bead detection.

[1] I. Utke, A. Gölzhäuser, Angew. Chem. Int. Ed. 2010, 49, 9328.

[2] L. Bernau et al., Angew. Chem. Int. Ed. 2010, 49, 8880.