Berlin 2012 – wissenschaftliches Programm
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DS: Fachverband Dünne Schichten
DS 22: Trends in atomic layer deposition I (Focused session – Organizer: Nielsch)
DS 22.5: Vortrag
Mittwoch, 28. März 2012, 16:45–17:00, H 0111
Optical applications of atomic layer deposition thin films — •Adriana Szeghalmi1, Thomas Weber1, Mato Knez2, Ernst Bernhard Kley1, and Andreas Tünnermann1 — 1Institute of Applied Physics, Friedrich Schiller University, Jena, Germany — 2Max-Planck Institute of Microstructure Physics, Halle (Saale) Germany
Thin films produced by atomic layer deposition (ALD) are very promising optical layers for the development of highly efficient optics. Here, a broad overview of optical elements developed based on ALD thin films and multilayers will be presented. ALD nanolaminates with a period below 10 nm have very low interlayer diffusion and roughness and can be applied as X-ray mirrors. Nanostructured optical elements can highly benefit of conformal ALD coatings. Metal wire polarizer elements for UV applications with high polarization extinction ratio at ca. 250 nm wavelength have been obtained by a frequency doubling technique using ALD deposition of iridium. Coating high aspect ratio linear gratings with high refractive index dielectric materials, guided mode resonance grating (GMRG) optics can be easily achieved. These resonant waveguides respond by a large spectral shift of the guided mode resonance peak in the reflectance or transmittance spectra to changes of the local dielectric environment. These elements find application as filters, mirrors, sensors, etc. The optical properties and sensitivity of GMRG optics have been optimized by rigorous coupled wave approach calculations. Using highly sensitive GMRG elements, the ALD growth of sub-nanometer thin films has been monitored in situ for the first time.