Berlin 2012 – wissenschaftliches Programm

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DS: Fachverband Dünne Schichten

DS 37: Poster II: Focused electron beam induced processing for the fabrication of nanostructures (focused session, jointly with O); Nanoengineered thin films; Layer properties: electrical, optical, and mechanical properties; Thin film characterization: structure analysis and composition (XRD, TEM, XPS, SIMS, RBS,..); Application of thin films

DS 37.17: Poster

Donnerstag, 29. März 2012, 15:00–17:00, Poster E

Structural study of amorphous SiCN:H hard coatings — •Andrea Sendzik, Steffen Schulze, Marcus Günther, Frank Richter, and Michael Hietschold — Institute of Physics, Chemnitz University of Technology, Reichenhainer Straße 70, 09126 Chemnitz, Germany

The thin coatings were produced by PECVD. A series of samples has been prepared, differing in terms of gas composition. The composition of the films was determined by ERDA. So it comes out that the silicon to carbon ratio remains nearly constant, but the ratio of nitrogen to silicon strongly depends on the deposition parameters. The atomic structure was investigated by TEM. From diffraction patterns and EELS-spectra findings about the short-range order of atoms, the composition, and the chemical bonding were made. Particular on the basis of the EELS spectra the bonding structure can be seen to vary with the gas rates. Core-level loss spectra indicate that there is predominantly single bonding, with the tendency to multiple bonding with rising nitrogen content. To get more information about the atomic structure, we have calculated the radial distribution functions (RDF) from diffraction patterns. With the help of Gaussian peak fitting one can assign the peaks and identify the elemental bonds occuring in the amorphous coating. With the results from the EELS and the RDF we are able to present a first schematic structure model of the amorphous SiCN hard coatings.