Berlin 2012 – wissenschaftliches Programm
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DS: Fachverband Dünne Schichten
DS 38: Poster III: Resistive switching (jointly with DF, KR, HL); Thermoelectric materials (Focused session); Micro- and nanopatterning (jointly with O); Ion irradiation effects
DS 38.25: Poster
Donnerstag, 29. März 2012, 17:30–19:00, Poster E
Pattern formation on ion beam eroded quartz glass surfaces — •Jan Lorbeer, Marc Teichmann, Frank Frost, and Bernd Rauschenbach — Leibniz-Institut für Oberflächenmodifizierung e. V., Permoserstr. 15, D-04318 Leipzig
The surface evolution quartz glass by low-energy ion beam erosion with and without simultaneous sample rotation is investigated. In detail the influence of the ion incidence angle ( θ = 0 − 85 deg), ion energy ( Eion = 800 − 2000 eV), ion species, fluence ( Φ ≈ 2 × 1018 − 1.5 × 1019 cm−2 ) and speed of rotation ( N = 1/60 − 30 rpm ) were evaluated.
For the non-rotating samples ripple pattern starts to form at ion incidence angles between 40 and 50 deg. For increasing erosion times the ripple structures reveal a distinct faceting and coarsening. The faceting can be explained by gradient dependent sputtering as an important topography evolution mechanism on fused silica [1]. The observed surface coarsening is explained by the contribution of reflected ions resulting in an incessantly vanishing of smaller facets [2].
These experiments where repeated with substrate rotation. It is shown, that the size of the emerging surface features decreases with increasing speed of rotation. The correlation between the speed of rotation and the emerging pattern allows an insight to the associated time scale of the underlying mechanism and the growth kinetics.
Support by Deutsche Forschungsgemeinschaft through Forschergruppe 845 is gratefully acknowledged.
[1] J. Völlner et. al., J. Appl. Phys. 109, 043501 (2011)
[2] W. Hauffe, Phys Status Solidi A 35, K93 (1976)