Berlin 2012 – wissenschaftliches Programm

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DS: Fachverband Dünne Schichten

DS 38: Poster III: Resistive switching (jointly with DF, KR, HL); Thermoelectric materials (Focused session); Micro- and nanopatterning (jointly with O); Ion irradiation effects

DS 38.34: Poster

Donnerstag, 29. März 2012, 17:30–19:00, Poster E

Plasma functionalization of self-organized Polystyrene Nanospheres — •Lienhard Wegewitz¹, Alexandra Prowald², Sebastian Dahle¹, Oliver Höfft², Frank Endres², and Wolfgang Maus-Friedrichs¹ — ¹Institut für Energieforschung und Physikalische Technologien, TU Clausthal, Leibnizstr. 4, 38678 Clausthal-Zellerfeld, Germany — ²Institut für Mechanische Verfahrenstechnik, TU Clausthal, Arnold-Sommerfeld-Str. 6, 38678 Clausthal-Zellerfeld, Germany

Polystyrene nanospheres are currently under investigation as litography masks and templates for the production of hollow inorganic spheres which have promising applications in catalysis and energy storage. In this regard the chemical functionalization and stabilization of the polystyrene framework is crucial.

Thin films of ordered polystyrene nanospheres with diameters of about 600 nm have been exposed to dielectric barrier discharges in different atmospheres and were subsequently chemically treatet in DMDCS and OMCTS. For the investigation of each treatment X-Ray Photoelectron Spectroscopy (XPS) and Atomic Force Microscopy (AFM) are applied. The plasma treatment of the spheres in oxygen yields a significant increase of carbon-oxygen bonds at the surface whereas a silane-plasma covers the spheres with a closed silicon nitride layer. After the wet chemical treatment silicon dioxide is detectable at the surface. Furthermore first experiments of electrochemical deposition with modified nanospheres as substrate will be shown.