Berlin 2012 – wissenschaftliches Programm
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DS: Fachverband Dünne Schichten
DS 44: Poster IV: Thin film photovoltaics; Organic electronics and photovoltaics (jointly with CPP, HL, O); Organic thin films; Trends in atomic layer deposition (Focused session)
DS 44.3: Poster
Freitag, 30. März 2012, 09:30–12:00, Poster E
Post-deposition optimization of LPCVD grown ZnO:B as front TCO in thin film silicon solar cells — •Thomas Bienert, Oleg Sergeev, Karsten von Maydell, and Carsten Agert — NEXT ENERGY. EWE Forschungszentrum für Energietechnologie e.V., Oldenburg, Germany
Thin film solar cells with superstrate configuration have very specific requirements for optical and electrical properties of the front contact, like high transmittance and haze as well as a low sheet resistance. Transparent conductive oxides (TCO) have already been proven to be a good choice, but their optical and electrical properties can be improved even after the deposition by various means. The LPCVD grown ZnO:B TCO in this study has been treated with hydrochloric acid (HCl) and H2-plasma prior to the deposition of µc-Si:H and a-Si:H pin-cells. The influence of such a treatment on optical and electrical properties of the TCO was investigated. The performance of the cells deposited on original and treated TCO was determined. It is shown that both treatments can be used to improve the overall TCO’s properties. It has been found the etching enhances surface topography and haze while H2-Plasma treatment decreases the sheet resistance significantly. The efficiency of both solar cell types (µc-Si:H as well as a a-Si:H pin) deposited on optimized LPCVD ZnO:B was increased by enhancement of the fill factor and of the photocurrent.