Berlin 2012 – wissenschaftliches Programm

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DS: Fachverband Dünne Schichten

DS 44: Poster IV: Thin film photovoltaics; Organic electronics and photovoltaics (jointly with CPP, HL, O); Organic thin films; Trends in atomic layer deposition (Focused session)

DS 44.55: Poster

Freitag, 30. März 2012, 09:30–12:00, Poster E

Optical Properties of Alucone Thin Films and Composite Materials — •Lilit Ghazaryan, Adriana Szeghalmi, Ernst-Bernhard Kley, and Andreas Tünnermann — Institute of Applied Physics, Friedrich Schiller University, Jena, Germany

Atomic layer deposition (ALD) is a powerful thin film coating technique that allows to precisely controlling the film thickness of inorganic coatings based on sequential self-limiting surface reactions. Similar to ALD, molecular layer deposition (MLD) enables growing completely organic or organic-inorganic hybrid polymer thin films typically using bi- or multifunctional monomers. One class of such hybrid polymers alucones had been recently grown with MLD using trimethylaluminium (TMA) as inorganic and ethylene glycol (EG) as organic constituent. In this contribution we have investigated the optical properties of alucone thin films prepared by MLD for possible applications as low refractive index optical coatings. The refractive index of the film can be precisely controlled through the composition of the coating. Using various bifunctional organic precursors it is possible to adjust the refractive index of the coating film in a controlled manner. Hybrid organic/inorganic nanolaminates have been deposited with ALD aluminium oxide and MLD alucone layers. By calcination of alucone layers at elevated temperatures it is possible to tune the refractive index of the coating to desired value. These films may find application in graded refractive index optical elements.