Jena 2013 –
wissenschaftliches Programm
P 18: Poster: Plasmatechnologie
Donnerstag, 28. Februar 2013, 14:00–16:00, Poster EG
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14:00 |
P 18.1 |
SiO2 hollow spheres prepared by plasma deposition on polystyrene spheres and subsequent calcination — •John Meuthen, Lienhard Wegewitz, Oliver Höfft, Alexandra Prowald, Wolfgang Maus-Friedrichs, and Frank Endres
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14:00 |
P 18.2 |
Development of an electric propulsion system for the UWE-4 pico satellite — •Mathias Pietzka, Marina Kühn-Kauffeldt, and Jochen Schein
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14:00 |
P 18.3 |
Quasi-linear versus nonlinear shadowing growth — •Peter Manz, Nicolas Fedorczak, Timo Dittmar, Tim Baloniak, and Achim von Keudell
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14:00 |
P 18.4 |
Kalorimetrische Untersuchung eines thermischen Atmosphärendruck-Plasmajets — •Thorben Kewitz, Maik Fröhlich und Holger Kersten
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14:00 |
P 18.5 |
Plasma-etched silicon-on-insulator structures for integration of photonic components in a high-performance BiCMOS process — •Harald Richter, David Stolarek, Mirko Fraschke, René Eisermann, Steffen Marschmeyer, Dieter Knoll, Katrin Schulz, Lars Zimmermann, and Bernd Tillack
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14:00 |
P 18.6 |
Abscheidung von Siliziumoxid- und Zinkoxidschichten mittels Mikrowellen-PECVD — •Stefan Merli, Andreas Schulz, Matthias Walker und Thomas Hirth
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14:00 |
P 18.7 |
Silicon dioxide coatings from dielectric barrier discharge in a two step process — •Sebastian Dahle, Henning Munkert, Wolfgang Viöl, and Wolfgang Maus-Friedrichs
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