Jena 2013 – scientific programme
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SYOS: Symposium Plasma und Optische Schichten
SYOS 3: Plasma und Optische Technologien III
Tuesday, February 26, 2013, 16:30–17:30, HS 4
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16:30 | SYOS 3.1 | Invited Talk: Design von amorphen optischen Schutzschichten mittels Multiskalenmodellierung — •Thomas Frauenheim |
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17:00 | SYOS 3.2 | Thin film deposition on flat surface using atmospheric pressure plasma source: influence of C:H ratio on film properties — •Ramasamy Pothiraja, Max Engelhardt, Björn Offerhaus, Nikita Bibinov, Jan Perne, and Peter Awakowicz |
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17:15 | SYOS 3.3 | Reactive co-sputtering processes in Ar:H2S and Ar:H2Se to deposit chalcopyrite absorber layers for thin film solar cells — •Jonas Krause, Man Nie, Karsten Harbauer, and Klaus Ellmer |