Regensburg 2013 – wissenschaftliches Programm
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CPP: Fachverband Chemische Physik und Polymerphysik
CPP 42: New Instruments and Methods
CPP 42.2: Vortrag
Donnerstag, 14. März 2013, 11:45–12:00, H39
Combining advanced sputter deposition and GISAXS - new avenues for in-situ experiments — Ralph Doehrmann1, Gunthard Benecke1,2, Sebastian Bommel1, Stephan Botta1, Berit Heidmann1, Gerd Herzog1, Roman Mannweiler1, Johannes Risch1, Matthias Schwartzkopf1, Gonzalo Santoro1, Shun Yu1, and •Stephan Volkher Roth1 — 1Deutsches Elektronen-Synchrotron (DESY), Notkestraße 85, D-22607 Hamburg, Germany — 2MPI Colloids and Interfaces Golm, Abt. Biomat., Wissenschaftspark Potsdam-Golm, D-14424 Potsdam, Germany
Nanocomposite structures play an important role in organic photovoltaics. To elucidate their structure-function relationship and to tailor them on the nanoscale, in-situ investigations following their formation are mandatory. These investigations have to cover the nano/molecular level to the mesoscale domain. This necessitates the use of scattering techniques like small- and wide angle x-ray scattering. Sputter deposition often is the final step in producing an electric contact in organic photovoltaic devices. We present a novel in-situ sputter deposition chamber for grazing incidence small- and wide-angle x-ray scattering investigations using microfocused x-ray beams [1,2]. We present first results of in-situ metal sputter deposition on inorganic and polymeric surfaces, using its unique high-temperature annealing and high-throughput capacities. This allows for the first time combinatorial in-situ microbeam GISAXS investigations to scan the parameter range during sputter deposition. [1] Roth et al., J. Phys: Cond. Matter 23, 254208 (2011) [2] Buffet et al., J. Synchr. Radiation 19, 647 (2012)