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Regensburg 2013 – wissenschaftliches Programm

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DS: Fachverband Dünne Schichten

DS 13: Poster Session III: Layer properties: electrical, optical and mechanical properties; Thin film characterization: structure analysis and composition (XRD, TEM; XPS, SIMS, RBS..)

DS 13.11: Poster

Montag, 11. März 2013, 17:00–20:00, Poster B1

Epitaxial Fe3O4/NiO bilayers grown on MgO(001) — •Tobias Schemme1, Florian Bertram2, Karsten Kuepper1, and Joachim Wollschlaeger11Fachbereich Physik, Universitaet Osnabrueck, Barbarastr. 7, 49076 Osnabrueck — 2HASYLAB, DESY, Notkestr. 85, 22607 Hamburg

The investigation of magnetic interactions at the interface of thin films is of huge physical and technological interest for instance for the development of magnetoresitive (MR) devices. Epitaxial Fe3O4/NiO bilayers were grown on MgO(001) substrates. First, a film of NiO was deposited on the substrate using molecular beam epitaxy (MBE) at 250C in a 10−5 mbar oxygen atmosphere. Afterwards a magnetite film was deposited on the NiO film via reactive MBE at the same temperature. In this study, bilayers with different NiO thicknesses but constant magnetite thickness were investigated. The stoichiometric composition of the oxide films was investigated by X-ray Photoelectron Spectroscopy (XPS), while the thickness and structure were examined by X-ray Diffraction (XRD) and Low Energy Electron Diffraction (LEED), respectively. Structural characterizations indicate a perfect epitaxy of the films. The LEED patterns of the magnetite films show the typical (√2×√2)R45 superstructure, while the LEED patterns of the NiO films show the expected (1×1) structure. X-ray Reflectometry (XRR) and XRD measurements were used to quantify the increasing thickness of the NiO films and to validate the crystallinity of the bilayer. The stoichiometric analysis via XPS proofs that the bilayer films consist of stoichiometric Fe3O4 and NiO.

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