Regensburg 2013 – wissenschaftliches Programm
Bereiche | Tage | Auswahl | Suche | Aktualisierungen | Downloads | Hilfe
DS: Fachverband Dünne Schichten
DS 13: Poster Session III: Layer properties: electrical, optical and mechanical properties; Thin film characterization: structure analysis and composition (XRD, TEM; XPS, SIMS, RBS..)
DS 13.7: Poster
Montag, 11. März 2013, 17:00–20:00, Poster B1
Enhanced wear resistance of a rhodium surface by interstitial alloying with boron — •Frank Müller1, Matthias Lessel1, Samuel Grandthyll1, Karin Jacobs1, Stefan Hüfner1, Stefan Gsell2, Michael Weinl2, and Matthias Schreck2 — 1Saarland University, Experimental Physics, 66041 Saarbrücken, Germany — 2University of Augsburg, Institute of Physics, 86135 Augsburg, Germany
Increasing the wear resistance of a Rh(111) surface can be obtained by ~ 1% alloying with boron atoms via a CVD (Chemical Vapour Deposition) process using trimethylborate, B(OCH3)3, at moderate temperatures of about 800 K. The fragmentation of the precursor molecules on the metal surface results in single boron atoms that are incorporated in the fcc lattice of the substrate, as displayed by X-ray Photoelectron Diffraction (XPD). The boron atoms penetrate into the host lattice up to 100 nm with the boron distribution displaying a nearly homogeneous depth profile, as tested by depth profiling experiments using combined X-ray photoelectron spectroscopy (XPS) and Ar ion etching. When compared to the untreated Rh(111) surface, the wear resistance of the B-"doped" Rh surface is increased to about 400%, as probed by scratching experiments using Atomic Force Microscopy (AFM).