Regensburg 2013 – wissenschaftliches Programm
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DS: Fachverband Dünne Schichten
DS 27: Thin Film Characterization: Structure Analysis and Composition (XRD, TEM, XPS, SIMS, RBS,...) I
DS 27.5: Vortrag
Mittwoch, 13. März 2013, 18:15–18:30, H32
In situ study of the texture development during the growth of magnetron sputtered VC thin films — •Sunil Kotapati1, Bärbel Krause1, Marthe Kaufholz1, Stephen Doyle2, Miguel Mantilla3, Michael Stüber4, Sven Ulrich4, and Tilo Baumbach1,2 — 1Institut für Photonenforschung und Synchrotronstrahlung, KIT, Germany — 2ANKA, KIT, Germany — 3Max-Planck-Institut für Intelligente Systeme, Stuttgart, Germany — 4Institut für Angewandte Materialien - Angewandte Werkstoffphysik, KIT, Germany
Hard coatings deposited by magnetron sputtering play a major role in enhancing the lifetime of machining tools and maintaining their productivity. In situ x-ray experiments during thin film deposition are an extremely useful tool to understand the interplay between the microstructure and macroscopic coating properties. The aim of this study is to develop a model for the structure formation of hard coatings as a function of different process parameters such as growth temperature and bias. For this, several Vanadium carbide (VC1-x) thin films were deposited at different growth conditions. In addition to in situ X-ray powder diffraction, the complementary ex situ methods AFM and TEM were used. The powder rings obtained during deposition reveal that below a transition temperature T~250°C, a mixture of [111] and [200] textures dominates, while the preferred [111] orientation is found above T. The real time measurements also show that there are structural changes as a function of deposition time.