Regensburg 2013 – wissenschaftliches Programm
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DS: Fachverband Dünne Schichten
DS 6: Focus Session: Ion Beam Induced Surface Patterns II
DS 6.4: Vortrag
Montag, 11. März 2013, 15:30–15:45, H8
Depth-resolved X-ray photoelectron and X-ray absorption spectroscopic study of Fe-implanted Si (100) — •behnam khanbabaee1, stefan facsko2, and ullrich pietsch1 — 1Universität Siegen, Festkörperphysik, 57072 Siegen, Germany — 2Helholtz-zentrum Dresden-Rossendorf, 01314 Dresden, Germany
The bombardment of solid surfaces with energetic ions such as Ar+, Kr+ can be used for the fabrication of self-organized structures on surfaces. It was shown that different types of patterns on the nanoscale, i.e. dots, ripples and relief pattern can be generated by varying the experimental parameters. A number of experimental studies have shown that the simultaneously co-deposition of metal atoms like Fe during ion beam erosion has tremendous influence on pattern formation. Many aspects of the influence of co-deposited metal atoms are not fully understood. However, the formation of Fe-silicide is considered important for pattern formation on Si surfaces. In this work, we report on the formation of Fe-silicide in various phases after a direct, off-normal, ion implantation of 5 keV Fe+ ions on Si (100). A combination of X-ray photoelectron spectroscopy (XPS) and grazing incidence X-ray absorption spectroscopy (XAS) using synchrotron radiation were applied to clarify surface chemical states of Fe implanted Si. We found the formation of Fe-rich silicide (Fe3Si) in the near surface region, but the dominance of Si-rich silicide (FeSi2) in larger depth.