Regensburg 2013 – wissenschaftliches Programm

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HL: Fachverband Halbleiterphysik

HL 87: Goup IV elements and their compounds II

HL 87.4: Vortrag

Donnerstag, 14. März 2013, 16:30–16:45, H15

Reactive Ion Etching of Nano- and Ultrananocrystalline Diamond Films for Fabrication of Nanopillars — Christo Petkov, Emil Petkov, Florian Schnabel, Wilhelm Kulisch, Johann Peter Reithmaier, and •Cyril Popov — Institute of Nanostructure Technologies and Analytics, Center for Interdisciplinary Nanostructure Science and Technology (CINSaT), University of Kassel, Heinrich-Plett-Str. 40, 34132 Kassel, Germany

One-dimensional diamond nanostructures, namely diamond nanopillars, have been prepared using nano- and ultrananocrystalline diamond films (NCD and UNCD, respectively) as starting materials. The fabrication process of arrays of nanopillars with diameters from 200 nm to 1000 nm consisted of their definition by electron beam lithography (EBL) applying gold or silica as a hard mask and subsequent inductively coupled plasma reactive ion etching (ICP-RIE) with oxygen. The major ICP-RIE parameters, like ICP power, RF power, working pressure, oxygen flow, etc. were optimized with respect to the quality of the nanopillars and the etching rate, which was monitored in situ with an interferometer. Furthermore, the influence of the hard mask material and pillar diameter on the geometry of the nanostructures was studied. The fabricated diamond nanopillars, especially those from NCD, can be used as photonic devices for integration of NV centers during the film growth or by follow-up ion implantation.