Regensburg 2013 – wissenschaftliches Programm

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HL: Fachverband Halbleiterphysik

HL 90: Poster Session: Quantum information systems; Optical properties; Ultrafast phenomena

HL 90.10: Poster

Donnerstag, 14. März 2013, 16:00–20:00, Poster A

Feedback loop for in-situ reflection measurement analysis and optimization during material processing of fs-laser structured silicon — •Anna Lena Baumann¹, Wolfgang Schippers¹, Thomas Gimpel¹, Stefan Kontermann¹, and Wolfgang Schade^1,2 — ¹Fraunhofer Heinrich Hertz Institute, EnergieCampus, Am Stollen 19B, 38640 Goslar, Germany — ²Clausthal University of Technology, EFZN, EnergieCampus, Am Stollen 19B, 38640 Goslar

Through femtosecond-laser pulse processing the absorption of silicon can be increased considerably and through incorporation of sulfur also extended in the infrared wavelength range. The increase in absorption in the visible wavelength range is due to a decrease in reflection of the surface structures that arise through the laser process. A setup for spot-by-spot femtosecond-laser scanning and realtime reflection measurement analysis is designed. Using a two axis stage system, a continuous wave laser reflection for feedback and a genetic algorithm for signal analysis, the optimal pulse shape for a tailored sample reflection can be found.