Regensburg 2013 – wissenschaftliches Programm
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O: Fachverband Oberflächenphysik
O 35: Poster Session I (Metal, semiconductor and oxide substrates: structure and adsorbates; Graphene)
O 35.30: Poster
Dienstag, 12. März 2013, 18:15–21:45, Poster B1
Site-specific geometric and electronic relaxation of cobalt-phthalocyanine on Cu(111) — •Christoph Bürker1, Alexander Gerlach1, Steffen Duhm2, Takuya Hosokai3, Blanka Detlefs4, Satoshi Kera5, Nobuo Ueno5, and Frank Schreiber1 — 1Institut für Angewandte Physik, Universität Tübingen, DE — 2Institute of Functional Nano & Soft Materials, Soochow University, CN — 3Department of Materials Science and Technology, Iwate University, JP — 4European Synchrotron Radiation Facility, FR — 5Graduate School of Advanced Integration Science, Chiba University, JP
We present X-ray standing wave (XSW) and ultraviolet photoelectron spectroscopy (UPS) data of cobalt-phthalocyanine (CoPc) on Cu(111). The XSW technique yields a slightly distorted geometry of the molecule upon adsorption as the cobalt, carbon and nitrogen atoms show different bonding distances (2.50 Å, 2.55 Å, and 2.60 Å, respectively). The relatively strong, chemisorptive interaction between molecule and substrate is confirmed by angle-resolved UPS measurements, which show the appearance of interface states. Hence, these two techniques show a site-specific geometric and electronic relaxation of CoPc on Cu(111). Finally, we compare our data both with theoretical findings for the same system [1] and with ZnPc on Cu(111) [2].
X. Chen and M. Alouani, Phys. Rev. B 82, 094443 (2010)
H. Yamane et al., Phys. Rev. Lett. 105, 046103 (2010)