Regensburg 2013 – wissenschaftliches Programm
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O: Fachverband Oberflächenphysik
O 35: Poster Session I (Metal, semiconductor and oxide substrates: structure and adsorbates; Graphene)
O 35.60: Poster
Dienstag, 12. März 2013, 18:15–21:45, Poster B1
Investigation of the MgO absorbate and the MgO/Fe on GaAs(001) surface by means of XPS and XPD — •Dominique Handschak1,2, Tobias Lühr1,2, Frank Schönbohm1,2, Christoph Keutner1,2, Ulf Berges1,2, and Carsten Westphal1,2 — 1Experimentelle Physik 1 - Technische Universität Dortmund, Otto-Hahn-Str. 4, D-44221 Dortmund, Germany — 2DELTA - Technische Universität Dortmund, Maria-Goeppert-Mayer-Str. 2, D-44221 Dortmund, Germany
We report on a combined high-resolution photoemission (XPS) and photoelectron diffraction (XPD) investigation of magnesium oxide on Fe. Magnesium oxide is an appliciable insulator in magnetic tunnel junctions (MTJ) based on the tunnel magnetoresistance (TMR)[1]. TMR-components are also of interest in the research of magneto-resistive random access memories (MRAM) [2,3,4]. In this study we report on the crystalline properties of the MgO adsorbate and the MgO/Fe interface. The results of the diffraction patterns revealed an interface with oxidized iron layers and partially shifted magnesium layers in a halite structure.
[1] M. Julliere, Physics Letters A 54, 225 (1975) [2] M. Xue, et al., Vacuum 85 (2010) [3] S. Parkin et al., Nature Materials 3 (2004) [4] S. Tehrani et al., Proceedings of the IEEE 91, 703 (2003) [5] D. Handschak et al., Phys. Rev. B submitted (2012)