Regensburg 2013 – wissenschaftliches Programm

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O: Fachverband Oberflächenphysik

O 58: Poster Session III (Solid-liquid interfaces; Scanning probe and other methods; Electronic structure theory; Spin-orbit interaction)

O 58.60: Poster

Mittwoch, 13. März 2013, 18:15–21:45, Poster B1

Fully Controlled, High Flux Electrospray Ion Beam Deposition of Nonvoaltile Molecules in Vacuum — •Stephan Rauschenbach1, Gordon Rinke1, Matthias Pauly1, and Klaus Kern1,21Max-Planck-Institute for Solid State Research, Stuttgart, Germany — 2Institut Physique de Matière Condensée, École Polytechnique Fédéral de Lausanne, Switzerland

The inherent chemical purity and the ability to control the growth make vapor deposition in vacuum an extremely successful technology with applications from food packaging to semiconductor devices. Large functional molecules of either natural or synthetic origin, however, tend to be thermally labile, which hinders the conventional vacuum processing by evaporation. Alternative approaches to evaporation often do not reach the performance of vapor deposition in vacuum terms of purity, control, versatility, or deposition rate.

We developed electrospray ion beam deposition (ES-IBD) as a method for the vacuum deposition of non-volatile molecules. ES-IBD is based on electrospray ionization, a soft ambient ionization method, creating intact molecular gas phase ions of even fragile molecules. The deposition apparatus is differentially pumped and contains ion optics in each stage, conveying the ion beam to the target in UHV, as well as current detectors and mass spectrometers, together providing full control over the deposition process. In addition our newly designed, hydrodynamically optimized electrospray ion source provides high flux and high efficiency, which demonstrates the potential of ES-IBD for commercial applications.

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