Berlin 2014 –
wissenschaftliches Programm
P 21: Plasma Technology II
Donnerstag, 20. März 2014, 10:30–12:45, SPA HS201
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10:30 |
P 21.1 |
Hauptvortrag:
HVDC Insulator Charging in SF6 Insulated Systems — •Ueli Straumann, Uwe Riechert, Robin Gremaud, Michael Schüller, and Christian M. Franck
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11:00 |
P 21.2 |
Hauptvortrag:
Plasma based deposition of nanoparticles and nanocomposites — •Thomas Strunskus
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11:30 |
P 21.3 |
Carbon micro-crystals and micro-bubbles deposition using filamentary pulsed atmospheric pressure plasma — •Ramasamy Pothiraja, Nikita Bibinov, and Peter Awakowicz
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11:45 |
P 21.4 |
Atmosphärendruck-Plasmamodifikation optischer Eigenschaften von Siliziumdioxid — •Christoph Gerhard, Stephan Wieneke und Wolfgang Viöl
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12:00 |
P 21.5 |
Reactive magnetron co-sputtering from In and Cu(Ga) targets in Ar:H2S or Ar:H2Se: poisoning mechanisms of the target and influences on the discharge voltage — •Jonas Schulte and Klaus Ellmer
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12:15 |
P 21.6 |
Stabilität von Isoliergasgemischen unter dem Einfluss nicht-thermischer Plasmen — •Thomas Hammer und Tetsuo Kishimoto
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12:30 |
P 21.7 |
Formation of metal and metal oxide nanoparticles generated in gas phase by pulsed DC sputtering in a reactive gas admixture — Oleksandr Polonskyi, Amir Mohammad Ahadi, Alexander Hinz, Egle Vasiliauskaite, •Thomas Strunskus, and Franz Faupel
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