Berlin 2014 – wissenschaftliches Programm
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P: Fachverband Plasmaphysik
P 3: Plasma Technology I
P 3.3: Vortrag
Montag, 17. März 2014, 15:00–15:15, SPA HS201
Plasma Simulations of a Sputter Source at Atmospheric Pressure — •Horia-Eugen Porteanu1, Ulrich Hornauer1,2, and Roland Gesche1,2 — 1Ferdinand-Braun-Institut, Leibniz Institut für Höchstfrequenztechnik, Berlin, Deutschland — 2Beaplas GmbH, Berlin, Deutschland
Sputtering at atmospheric pressure is a new application of microplasma sources. Microwave energy is used to ionize helium atoms and to maintain a certain electron and gas temperature. Additionally to the microwave field, a dc field is applied in order to accelerate He atoms toward an Au target. In spite of the high density of the gas at atmospheric pressure, He atoms can acquire sufficiently high kinetic energy from the dc field because of their small collision cross section. High speed He atoms are then able to remove Au atoms from a target and to sputter them on different cold surfaces at a distance of few mm. In this contribution we present simulations within the plasma module of the COMSOL Multiphysics® software. Gasflow, microwave and dc fields, and plasma fluid model are combined in order to describe the physical processes. Electron density and plasma potential are compared with experimental data obtained in different conditions with Langmuir I-V measurements. Gas velocity and electron density distributions are calculated for different geometric arrangements in order to improve the deposition rate.