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Berlin 2018 – wissenschaftliches Programm

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HL: Fachverband Halbleiterphysik

HL 19: Quantum dots and wires: Transport properties

HL 19.12: Vortrag

Dienstag, 13. März 2018, 12:30–12:45, A 151

Coulomb staircase in CMOS-compatible large-area junctions of self-assembled quantum dots using grapheneHippolyte P.A.G. Astier1, Joel M. Fruhman1, Lissa Eyre1, Bruno Ehrler4, Marcus Boehm1, Piran R. Kidambi2, Ugo Sassi2, Domenico De Fazio2, Jonathan P. Griffiths1, Alexander Robson3, Benjamin J. Robinson3, Stephan Hofmann2, Andrea C. Ferrari2, and •Christopher J.B. Ford11Cavendish Laboratory, JJ Thomson Av. CB3 0HE, Cambridge, UK — 2Cambridge Graphene Centre, 9 JJ Thomson Av. CB3 0FA, Cambridge, UK — 3Department of Physics, University of Lancaster, Lancaster LA1 4YB, UK — 4Center for Nanophotonics, AMOLF, Science Park 104, 1098 XG, Amsterdam, The Netherlands

Nanomaterial and molecular electronics suffers from unscalable and complex fabrication. Here, we use graphene to make arrays of ∼1µm2 junctions contacting self-assembled monolayers of PbS quantum dots (QDs) to obtain films with zero-dimensional transport characteristics. Our junctions exhibit Coulomb blockade and staircases with a yield above 40% before optimisation, thus demonstrating single-electron effects in a robust and scalable architecture. Electron-beam lithography can reduce contact areas to nanometre sizes, enabling a statistical comparison between junctions with a range of QD numbers. Topographical imaging combining atomic force microscopy (AFM) and ultrasonic force microscopy (UFM) allows us to investigate the conduction parameters in these complex films in relation to their mechanical aspect.

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