Berlin 2018 – wissenschaftliches Programm

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O: Fachverband Oberflächenphysik

O 46: Poster: Molecular Films - Photovoltaics, Electronics and Morphology

O 46.5: Poster

Dienstag, 13. März 2018, 18:15–20:30, Poster A

Advanced ion optics for Controlled Electro Spray Ion Beam Deposition — •Andreas Walz, Karolina Stoiber, Hartmut Schlichting, and Johannes Barth — Physics Department E20, Technical University of Munich, Germany

The world of nanostructures requires precise control of growth of atomically clean films of particles or molecules on well defined surfaces. Most state of the art techniques to produce such layers like Organic Molecular Beam Epitaxy (OMBE) are limited to small and sublimable particles or molecules. Controlled Ion Beam Depostition (CIBD) gives access to more reactive, fragile and thermolabile species including many biomolecules. One approach is the generation of an ion beam via Electro Spray Ionisation (ESI) at near ambient conditions, its subsequent transfer to Ultra High Vacuum (UHV) and the Soft-Landing on a surface. The challenge using CIBD is to effectively overcome pressure differences of several orders of magnitude while preserving a high ion flux for appropriate preparation times. Here we present some advanced ion optics including a modified high-flux stacked ring ion guide, as well as a square wave driven multipole. To guarantee for a highly purified ion beam with precise control over the deposited species a sophisticated Square-Wave Quadrupole Mass Spectrometer with adjustable frequency and nearly unlimited mass range was established. The construction was assisted by a multitude of simulations done with SIMION.