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Regensburg 2019 – wissenschaftliches Programm

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O: Fachverband Oberflächenphysik

O 35: 2D Materials I: Growth and Properties of Transition Metal Dichalcogenides, Phase Transitions

O 35.10: Vortrag

Dienstag, 2. April 2019, 16:15–16:30, H14

Nano-patterning of MoS2 monolayers with focused ion beam — •Rajeshkumar Mupparapu1, Michael Steinert1, Antony George2, Franz Löchner1, Zian Tang2, Tobias Bucher1, Frank Setzpfandt1, Andrey Turchanin2, Thomas Pertsch1, and Isabelle Staude11Institute of Applied Physics, Abbe Center of Photonics, Friedrich Schiller University Jena, Jena, Germany — 2Institute of Physical Chemistry, Friedrich Schiller University Jena, Jena, Germany

Monolayers of transition metal dichalcogenides (TMD-MLs) are immensely interesting for their versatile emission properties [1]. Typically, emission of these extremely thin materials is manipulated either by integrating them on to nanostructures or by assembling into heterostructures. Nano-patterning of TMD-MLs into desired shapes and sizes adds another degree of freedom for their emission manipulation [2, 3]. In this work, we report on nano-patterning of MoS2 monolayers (MoS2-MLs) with focused gallium-ion beam while minimizing the damage to the MoS2 material. To investigate the influence of nano-patterning on emission properties of MoS2-MLs, we performed photoluminescence, Raman and second harmonic generation measurements. References: [1]. Q. Wang et al., Nat. Nanotech., 7, 699-712 (2012). [2]. W. Guohua et al., Sci. Rep., 7, (2017). [3]. J. Yang et al., Light Sci. Appl., 5, e16046 (2016).

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