Dresden 2020 – wissenschaftliches Programm
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CPP 102.4: Vortrag
Donnerstag, 19. März 2020, 15:45–16:00, WIL B321
Fabrication of highly regular Moth-Eye inspired Nanostructures to generate Anti-Reflective Surfaces — •Louise Kaeswurm, Zhaolu Diao, Johannes Hirte, Klaus Weishaupt, and Joachim Spatz — Max-Planck-Institute for Medical Research, Jahnstr. 29, 69120 Heidelberg, Germany
We developed a possibility to create highly regular moth-eye inspired anti-reflective (AR) nanostructures on different substrates such as silica glass, sapphire, diamond and silicon. Although thin-film technology can solve reflection related problems to a certain extent, AR moth-eye nanostructures have many advantages.
The method proposed is based on block copolymer micellar lithography to apply an etching mask and reactive ion etching to nanostructure the surface. Compared to other fabrication methods, this approach is fast and easily scalable. The method is based on the principle of index matching: the generated nanostructures lead to the reported reduction of the reflectivity. For transparent substrates the transmission is severely increased, for non-transparent the absorption. Since nanopillars and bulk are the same material, mechanical stress is reduced enabling applications in the high-energy regime. I.e. laser systems and EUV technology can profit from such an AR treatment. Additionally, AR sapphire windows for endoscopes can improve the imaging quality and AR silicon enhances the efficiency of different electronic devices. Further developing the processes will enable the use of the full potential of such AR surfaces for a variety of applications ranging from electronics to medical and optical applications.