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DS: Fachverband Dünne Schichten
DS 30: Poster: Organic Thin Films and Thin Oxides
DS 30.9: Poster
Mittwoch, 18. März 2020, 15:00–18:00, P1A
A novel approach for fabrication of photochromic organic thin films via initiated Chemical Vapor Deposition (iCVD) — •Maximilian Heiko Burk1, Stefan Schröder1, Daniel Langbehn2, Widukind Moormann2, Thomas Strunskus1, Stefan Rehders1, Rainer Herges2, and Franz Faupel1 — 1Christian-Albrechts University Kiel, Institute for Materials Science, Kaiserstr. 2, 24143 Kiel, Germany. — 2Christian-Albrechts University Kiel, Otto-Diels-Institute for Organic Chemistry, Otto-Hahn-Platz 4, 24118 Kiel, Germany.
Initiated Chemical Vapor Deposition (iCVD) is a solvent-free, cost efficient technique to synthesize highly conformal organic thin films from the vapor phase. The underlying free radical polymerization can be specifically tuned by the deposition parameters and enables furthermore co-polymerization of manifold functional monomers.
In this work we demonstrate the first synthesis of photochromic organic thin films via iCVD deposition. The underlying concept is represented by sublimation of a solid photoswitchable styrenediazocine in a tailor-made steel unit and transportation into the reactor chamber via an inert carrier gas. The photochromic compound was co-polymerized with V3D3, a triple-functional cyclic compound to guarantee maximum rotational freedom of the azo-group after covalent bonding. Due to a high controllability of the uniform film formation, topography preservation and manifold choice of potential substrates it is possible to equip surfaces with photoswitchable properties in the nano-range without losing the characteristic properties of the material.