Dresden 2020 – wissenschaftliches Programm
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DS 31.4: Poster
Mittwoch, 18. März 2020, 15:00–18:00, P1A
Broadband antireflection coatings on polymethylmethacrylate prepared by Atomic Layer Deposition — •Lukas Gümbel, Philip Klement, Jörg Schörmann, and Sangam Chatterjee — Institute of Experimental Physics I and Center for Materials Research (ZfM), Justus Liebig University Giessen, Giessen, Germany
Transparent plastic optics are lighter than glass and easy to manufacture. They require surface functionalities such as antireflection and scratch-resistant coatings to enable their applications which is typically done by plasma-assisted processes that can damage the polymer substrate. Atomic Layer Deposition (ALD) offers precise thickness and composition control without thermally or plasma-stressing the underlying substrate.
Here we present broadband antireflection coatings on polymethylmethacrylate prepared by Atomic Layer Deposition. A thin Al2O3 film acting as adhesion layer is deposited from the trimethylaluminum-H2O-process, and the processing parameters are optimized yielding a high GPC and ultra-smooth surfaces. Combining this with ALD-grown ZnO and SiO2 facilitates antireflection coatings in the visible range that perfectly match precalculated antireflection designs. Our results enable precise conformal antireflection coatings of plastic optics.