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DS: Fachverband Dünne Schichten
DS 45: Thin Film Properties: Structure, Morphology and Composition III
DS 45.3: Vortrag
Freitag, 20. März 2020, 10:00–10:15, CHE 89
Metal phosphide deposited by atomic layer deposition for efficient electrochemical water splitting — •Haojie Zhang1, Stefan L. Schweizer1, and Ralf B. Wehrspohn1, 2 — 1Institute of Physics, Martin Luther University Halle-Wittenberg, Heinrich-Damerow-Straße 4, 06120 Halle (Saale), Germany. — 2Fraunhofer Institute for Microstructure of Materials and Systems, Walter-Hülse-Straße 1, Halle (Saale), Germany.
Transitional metal phosphide (TMP) has attracted great research interests due to its tunable crystal phases and excellent catalytic activity for electrochemical water splitting. However, TMP prepared by atomic layer deposition (ALD) has not be reported to date. Therefore, we herein report an improved ALD process to produce well-crystalline TMP ultrathin films. Our optimized ALD recipe demonstrated a controllably layer-by-layer deposition behavior. Furthermore, the deposited TMP exhibited a better hydrogen evolution reaction performance than that prepared by the traditional post-phosphorization method. Our strategy shows a huge application potential in various electrochemical areas.