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MA: Fachverband Magnetismus
MA 60: Magnetic Coupling and Anisotropy in Thin Films (joint session MA/DS)
MA 60.7: Vortrag
Freitag, 20. März 2020, 11:15–11:30, HSZ 04
Crystallographic and magnetic structure in Co thin films investigated by NMR — •Patrizia Fritsch1, Juriaan Lucassen2, Casper F. Schippers2, Marcel A. Verheijen2,3, Erik J. Geluk4, Beatrice Barcones4, Rembert A. Duine2,5, Henk J. M. Swagten2, Bert Koopmans2, Reinoud Lavrijsen2, and Sabine Wurmehl1,6 — 1IFW Dresden, Germany — 2Department of Applied Physics, TU Eindhoven, the Netherlands — 3Eurofins Materials Science, Eindhoven, the Netherlands — 4NanoLab@TU/e, TU Eindhoven, the Netherlands — 5Institute for Theoretical Physics, Utrecht University, the Netherlands — 6Institute of Solid State and Materials Physics, TU Dresden, Germany
Co thin films sandwiched between Pt and Ir (Pt (4 nm) / Co (t) / Ir (3 nm)) with t = 5 - 25 nm were grown. These films showed an increase in the out of plane (oop) magnetic anisotropy constant K above a critical thickness tcr. The increase in the anisotropy K is linked to the formation of hcp Co on top of fcc Co due to lattice relaxation with increasing thickness t. We measured two films with Co thicknesses t = 10 nm > tcr > t = 25 nm by means of 59Co zero-field nuclear magnetic resonance spectroscopy (ZF NMR) exploiting the internal field of the ferromagnetic material. ZF NMR is sensitive to changes in the local crystallographic and magnetic environment. In this contribution we will explain the overall increase of the anisotropy K due to magnetocrystalline (intrinsic) and magnetoelastic (extrinsic) effects on the basis of the 59Co ZF NMR data.