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SurfaceScience21 – wissenschaftliches Programm

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O: Fachverband Oberflächenphysik

O 33: Poster Session III: Semiconductor substrates I

Dienstag, 2. März 2021, 10:30–12:30, P

10:30 O 33.1 Molecular Beam Epitaxy of InAs(111)A — •Steffen Zelzer, Rajib Batabyal, Xiaojing Zhao, Mohana Rajpalke, and Peter Krogstrup
10:30 O 33.2 Virtual III-V-on-Si substrates grown by MOVPE - reduction of stacking faults — •Manali Nandy, Agnieszka Paszuk, Markus Feifel, Christian Koppka, Peter Kleinschmidt, Frank Dimroth, and Thomas Hannappel
10:30 O 33.3 Atomic and electronic structure of the GaP/Si(001) heterointerface studied by HAXPES — •Agnieszka Paszuk, Oleksandr Romanyuk, Igor Bartoš, Regan G. Wilks, Manali Nandy, Jakob Bombsch, Claudia Hartmann, Raül Garcia-Diez, Shigenori Ueda, Ivan Gordeev, Jana Houdkova, Peter Kleinschmidt, Marcus Bär, Peter Jiříček, and Thomas Hannappel
10:30 O 33.4 Structural LEED analysis of the reconstructed Si(001) surface — •Jascha Bahlmann, Kris Holtgrewe, Simone Sanna, and Joachim Wollschläger
10:30 O 33.5 Temperature dependent adsorption of Trimethylamine (TMA) on water-functionalized Si(001)-(2x1) surfaces — •Niklas Fornefeld, Lucia Pérez Ramírez, François Rochet, Stefan Kubsky, and Ulrich Köhler
10:30 O 33.6 Enhancing structural order by random Au adsorption on the Si(553)-Au system — •Christa Fink, Kris Holtgrewe, Simone Sanna, Zamin Mamiyev, and Herbert Pfnür
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