Regensburg 2022 – wissenschaftliches Programm
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CPP: Fachverband Chemische Physik und Polymerphysik
CPP 14: Emerging Topics in Chemical and Polymer Physics, New Instruments and Methods
CPP 14.6: Vortrag
Dienstag, 6. September 2022, 10:45–11:00, H39
STED-Inspired Sub Diffractional Cationic Lithography — •Sourav Islam1, Marco Sangermano2, and Thomas Klar1 — 1Institute of Applied Physics, Johannes Kepler University Linz, 4040 Linz, Austria — 2Department of Applied Science and Technology, Politecnico Di Torino, Torino, Italy
Cationic polymerization has come out as a low cost, efficient, bio-compatible alternative to radical polymerization because of lower toxicity of the monomers, lower shrinkage stress, no oxygen inhibition. Although the mechanism of cationic polymerization is well understood(1), the knowledge about two-photon induced cationic polymerization is still insufficient. In our work, we try to fill the void in the knowledge of two photon induced cationic polymerization and the scope of STED-inspired (2) sub diffractional lithography. 3,4-Epoxycyclohexylmethyl 3,4 epoxycyclohexanecarboxylate (CE) was used as monomer and Triarylsulfonium hexafluoroantimonate salts and 2-Isopropylthioxanthone (ITX) were used as onium salt and photo-sensitizer, respectively. 110fs laser pulses of 780nm wavelength were used to write two-photon polymer lines with a feature size of 315nm. Furthermore, 60% suppression of polymerization was achieved using an additional 660nm continuous beam overlapped with 780nm beam. To obtain further reduction of the feature size, a donut shaped beam profile was produced by installing a 2-pi phase plate in the 660 nm beam path. This way, lines of 195 nm feature size were achieved. 1.M. Sangermano Pure and Applied Chemistry, 84, 2089 (2012). 2.Fischer, Wegener, Opt. Mat. Exp. 1, 614 (2022)