Regensburg 2022 – wissenschaftliches Programm

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DS: Fachverband Dünne Schichten

DS 21: Layer Deposition (ALD, MBE, Sputtering, ...)

Donnerstag, 8. September 2022, 09:30–10:30, H14

	09:30	DS 21.1	The contribution has been withdrawn.
	09:45	DS 21.2	Molecular-beam epitaxy of Cd- and Nb-containing BixSey-based compounds for novel topological materials — •Christoph Ringkamp, Abdur Rehman Jalil, Erik Zimmermann, Peter Schüffelgen, Thomas Schäpers, Gregor Mussler, and Detlev Grützmacher
	10:00	DS 21.3	Growth and Characterization of Epitaxial (Cr1-xMnx)2GaC MAX Phase Thin Films by Pulsed Laser Deposition — •Ivan Tarasov, Hanna Pazniak, Michael Farle, and Ulf Wiedwald
	10:15	DS 21.4	The contribution has been withdrawn.