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SKM 2023 – wissenschaftliches Programm

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HL: Fachverband Halbleiterphysik

HL 51: Nitrides: Preparation and Characterization

Freitag, 31. März 2023, 09:30–12:15, POT 112

09:30 HL 51.1 High resistive buffer layers by Fermi-level engineering — •Armin Dadgar, Ralf Borgmann, and André Strittmatter
09:45 HL 51.2 yolo-assisted object detection of dislocation-related pits on GaN surfaces using generative adversarial networks — •Mahdi Khalili Hezarjaribi, Uwe Rossow, Heiko Bremers, and Andreas Hangleiter
10:00 HL 51.3 Molecular beam epitaxy growth study and characterization of HoN thin films — •Anna Melendez-Sans, Vanda M. Pereira, Chun-Fu Chang, Chang-Yang Kuo, Chien-Te Chen, Liu Hao Tjeng, and Simone G. Altendorf
10:15 HL 51.4 Theoretical study on the (Al,Sc)N random alloy — •Jan M. Waack, Markus Kremer, Michael Czerner, and Christian Heiliger
10:30 HL 51.5 Thermal Transport in c-plane GaN Membranes Studied by Raman Thermometry — •Wilken Seemann, Joachim Ciers, Isabell Hüllen, Mahmoud Elhajhasan, Jean-François Carlin, Nicolas Grandjean, Åsa Haglund, and Gordon Callsen
  10:45 15 min. break
11:00 HL 51.6 SmN thin films: MBE-growth and spectroscopy studies — •Vanda M. Pereira, Anna Melendez-Sans, Chun-Fu Chang, Chang-Yang Kuo, Chien-Te Chen, Liu Hao Tjeng, and Simone G. Altendorf
11:15 HL 51.7 Growth of ScN and AlScN by reactive sputter epitaxy — •Florian Hörich, Christopher Lüttich, Ralf Borgmann, Jürgen Bläsing, André Strittmatter, and Armin Dadgar
11:30 HL 51.8 On the variation of PL intensity in GaInN/GaN quantum wells with different cladding thicknesses — •Nico Wagner, Shawutijiang Sidikejiang, Philipp Henning, Rodrigo de Vasconcellos Lourenço, Heiko Bremers, Uwe Rossow, and Andreas Hangleiter
11:45 HL 51.9 Optical properties of ScN films grown by HVPE and sputter epitaxy — •Jona Grümbel, Yuichi Oshima, Christopher Lüttich, Armin Dadgar, Martin Feneberg, and Rüdiger Goldhahn
12:00 HL 51.10 Temperature dependent spectroscopic ellipsometry on cubic GaN — •Jonas Rose, Elias Baron, Rüdiger Goldhahn, Michael Deppe, Donat J. As, and Martin Feneberg
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