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KFM: Fachverband Kristalline Festkörper und deren Mikrostruktur
KFM 7: Focus: High-resolution Lithography and 3D Patterning
KFM 7.7: Vortrag
Mittwoch, 29. März 2023, 11:35–11:55, POT 51
Two-Photon Polymerization Lithography Structures Characterized via Raman Spectroscopy and Nanoindentation — •Severin Schweiger1,2, Tim Schulze1,2, Peter Reinig1, Simon Schlipf3, and Harald Schenk1,2 — 1Fraunhofer Institute for Photonic Microsystems, Maria-Reiche-Str. 2, Dresden, Germany, 01109 — 2Brandenburg University of Technology, Platz der Deutschen Einheit 1, Cottbus, Germany, 03046 — 3Fraunhofer Institute for Ceramic Technologies and Systems, Maria-Reiche-Str. 2, Dresden, Germany, 01109
Additive manufacturing using two-photon polymerization (TPP) lithography has gathered interest in industry and research. Parameter sweeps of cuboid structures fabricated using TPP lithography were investigated to find dependent mechanical material properties across the parameters of the laser power and scan speed. Raman spectroscopy and micro- or nanoindentation were used on the cuboids to find the degree of conversion (DC) of monomer to polymer and the Youngs modulus (E), respectively. The DC and E found for the photoresist IP-Dip was 20 % to 45 % and 1 to 2.1 GPa, respectively. These results were compared to reports found in the literature. The DC and E found for the photoresist IP-Q, was 53 % to 80 % and 0.5 to 1.3 GPa, respectively. The properties found for IP-Q are the current state of knowledge for this photoresist. Many structures fabricated via TPP and based on IP-Q can benefit from this knowledge and the customizability of the material. Examples are evaluated and discussed in the presentation.