SKM 2023 –
wissenschaftliches Programm
KFM 7: Focus: High-resolution Lithography and 3D Patterning
Mittwoch, 29. März 2023, 09:00–12:35, POT 51
While high-resolution 2D lithography and structuring is relatively matured and also widely applied in industrial processes, work on its 3D variant is mostly focusing on fundamental aspects and process development. At the lower edge of possible 3D feature dimensions, certainly methods such as focused electron beam induced deposition (FEBID), non-linear multi-photon-laser lithography and thermal scanning probe lithography techniques are required. This session will discuss most of these dedicated 3D methods in detail. For the fabrication of complex 2D and 2.5D patterns, advanced electron beam and X-ray methods are continuously developed further. In addition, new methods such as high resolution Talbot lithography for relatively large areas are already entering industrial maturity. This session will also discuss some of the latest developments in this field of binary lithography.
Chair: Dr. Frank Heyroth (Martin-Luther-Universität Halle)
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09:00 |
KFM 7.1 |
Hauptvortrag:
Novel device integration -- combining bottom-up and topdown approaches — •Artur Erbe
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09:30 |
KFM 7.2 |
Optical properties of photoresists for femtosecond 3D printing: Refractive index, extinction, luminescence - dose dependence, aging, heat treatment and comparison between 1-photon and 2-photon exposure — •Michael Schmid, Dominik Ludescher, and Harald Giessen
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09:50 |
KFM 7.3 |
3D direct laser writing of miniature optical apertures with highly absorptive photoresist — •Michael Schmid, Andrea Toulouse, Simon Thiele, Simon Mangold, Alois Herkommer, and Harald Giessen
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10:10 |
KFM 7.4 |
Self-Folding micro cubes of laser-cut templates — •Pierre Lorenz, Ye Yu, Ronald Franz, Joachim Zajadacz, Martin Ehrhardt, Robert Kirchner, Gregory Lecrivain, and Klaus Zimmer
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10:30 |
KFM 7.5 |
High resolution and process stability tests on new HSQ based resists — •Nicolas Kunzfeld and Axel Rudzinski
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10:50 |
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15 min. break
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11:05 |
KFM 7.6 |
Hauptvortrag:
4D meso-scale electronics for next generation medical tools and electronic skins — •Daniil Karnauschenko
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11:35 |
KFM 7.7 |
Two-Photon Polymerization Lithography Structures Characterized via Raman Spectroscopy and Nanoindentation — •Severin Schweiger, Tim Schulze, Peter Reinig, Simon Schlipf, and Harald Schenk
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11:55 |
KFM 7.8 |
Dry film resists: A promising material class for micro-/acoustofluidic chip fabrication — •Andreas Winkler
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12:15 |
KFM 7.9 |
Artificial Intelligence for high resolution multi-photon lithography — •Julian Hering-Stratemeier, Sven Enns, Nicolas Lang, and Georg von Freymann
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