SKM 2023 – scientific programme
Parts | Days | Selection | Search | Updates | Downloads | Help
KFM: Fachverband Kristalline Festkörper und deren Mikrostruktur
KFM 7: Focus: High-resolution Lithography and 3D Patterning
KFM 7.9: Talk
Wednesday, March 29, 2023, 12:15–12:35, POT 51
Artificial Intelligence for high resolution multi-photon lithography — •Julian Hering-Stratemeier1, Sven Enns1,2, Nicolas Lang1, and Georg von Freymann1,2,3 — 1Physics Department and State Research Centre OPTIMAS, TUK, 67663 Kaiserslautern, Germany — 2Opti-Cal GmbH, 67663 Kaiserslautern, Germany — 3Fraunhofer Institute for Industrial Mathematics ITWM, 67663 Kaiserslautern, Germany
Multi-photon lithography, a.k.a. direct laser writing (DLW), is one of today's most flexible high resolution 3D additive manufacturing technologies. Nevertheless, there are fundamental restrictions, limiting its resolution and structure-conformity: First, the shape of the polymerization-triggering laser focus limits the minimal volume that gets solidified (voxel). Hence, laser focus shape distorting optical aberrations within the beam path worsen the quality of the 3D printed outcome. Second, the physico-chemical properties of the photo resins influence the sharpness and extensions of single voxels, and, therefore, the 3D printed structure quality and resolution as well. Here, we show very first steps (i) towards a fast algorithm for predicting those error-loaded structures. Moreover, we use artificial intelligence (ii) to correct for optical aberrations within the beam path and (iii) to pre-compensate for the photo resin's outcome-worsening properties. Especially correcting aberrations is crucial for, e.g., extending DLW to high resolution STED-inspired DLW which is analogue to the well-known and Nobel price warded STED-microscopy.