SKM 2023 – wissenschaftliches Programm
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O: Fachverband Oberflächenphysik
O 32: Semiconductor Substrates
O 32.5: Vortrag
Dienstag, 28. März 2023, 11:30–11:45, GER 39
In situ XPS Study on ultrathin FexOy Films on SrTiO3 — •Pia Maria Düring, Timo Krieg, and Martina Müller — Fachbereich Physik, Universität Konstanz, 78457 Konstanz, Germany
Oxide interfaces are emerging as one of the most interesting systems in condensed matter physics as they exhibit a multitude of physical phenomena such as 2D electron/hole gas, superconductivity, or the Spin Hall effect. One of the main processes that controls the physical properties is the oxygen exchange between the film and the substrate. The tunability of the oxygen transfer using different growth parameters opens up the possibility to unravel unexplored properties.
Using our UHV-MBE system, we grow high-quality ultrathin Fe-oxide films on SrTiO3 substrates by systematically varying certain growth parameters. Performing in situ X-ray Photoelectron Spectroscopy and Low Energy Electron Diffraction enables the analysis of the electronic properties and crystalline structure of ultrathin FexOy films directly after the growth without any atmospheric contamination.
The present work discusses the effect of different growth temperatures, substrate annealing procedures, and film thicknesses of the FexOy films on the interfacial properties like oxygen vacancies. The results open up the possibility for the emergence of 2D electronic states at the interface by tuning such growth parameters.