SKM 2023 – wissenschaftliches Programm

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O: Fachverband Oberflächenphysik

O 32: Semiconductor Substrates

Dienstag, 28. März 2023, 10:30–12:45, GER 39

10:30 O 32.1 Progress in local growth of III/V-semiconductor structures — •Christian Bruckmann, Jürgen Bläsing, Armin Dadgar, and André Strittmatter
10:45 O 32.2 Post-synthesis of copper nitride monolayers from copper oxide films — •Mohammadreza Rostami, Biao Yang, Francesco Allegretti, Lifeng Chi, and Johannes V. Barth
11:00 O 32.3 The role of mechanical strain in rare-earth silicide monolayers on Si(111) — •Kris Holtgrewe and Simone Sanna
11:15 O 32.4 Electronic and magnetic properties of ultrathin FeBr2 films grown on Bi/Si(111) — •Shigemi Terakawa, Jiabao Yang, Shinichiro Hatta, Hiroshi Okuyama, Tetsuya Aruga, Niels Schröter, and Stuart Parkin
11:30 O 32.5 In situ XPS Study on ultrathin FexOy Films on SrTiO3 — •Pia Maria Düring, Timo Krieg, and Martina Müller
  11:45 O 32.6 The contribution has been withdrawn.
12:00 O 32.7 About the excitation of island growth orthogonal to the surface in the substrate Pb/Si(111)-(7x7) — •Paul Philip Schmidt, Lea Faber, and Regina Hoffmann-Vogel
12:15 O 32.8 Solution-Synthesized Extended Graphene Nanoribbons Deposited by High-Vacuum Electrospray Deposition — •Sebastian Scherb, Antoine Hinaut, Xuelin Yao, Alicia Götz, Samir H. Al-Hilfi, Xiao-Ye Wang, Yunbin Hu, Zijie Qiu, Yiming Song, Klaus Müllen, Thilo Glatzel, Akimitsu Narita, and Ernst Meyer
  12:30 O 32.9 The contribution has been moved to O 85.4.
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