DS 4: Layer Deposition
Monday, March 18, 2024, 16:00–17:15, A 060
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16:00 |
DS 4.1 |
Real-Time Investigations during Sputter Deposition on Polymer Thin Films. — •Matthias Schwartzkopf
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16:15 |
DS 4.2 |
Fast and efficient simulation of the FEBID process — •Alexander Kuprava and Michael Huth
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16:30 |
DS 4.3 |
GaS - a Two-Dimensional UV emitting material: Challenges of MOCVD Synthesis — •Robin Günkel, Stefan Renato Kachel, Leonard Neuhaus, Lukas Erlemeier, Tigmanshu Sundrial, Johannes Glowatzki, Jürgen Belz, Carsten von Hänisch, J. Michael Gottfried, and Kerstin Volz
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16:45 |
DS 4.4 |
MBE growth and characterization of α-FeGe2 films on GaAs(001) — •Moritz N. L. Hansemann, Michael Hanke, Achim Trampert, and Jens Herfort
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17:00 |
DS 4.5 |
Energetische Anpassung von Magnetron-Sputter-Abschei- dungsprozessen für defektempfindliche Materialien: Transparente leitfähige Oxide und andere Halbleiter — •Klaus Ellmer
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