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DS: Fachverband Dünne Schichten
DS 21: Optical Analysis of Thin Films
DS 21.9: Vortrag
Freitag, 13. März 2026, 12:00–12:15, REC/C213
Measuring sub-nanometer oscillations of a thin gold film by a combination of ultrafast imaging ellipsometry and interferometry — •Markus Olbrich1,2, Theo Pflug1,3, Andy Engel1, Andrés Lasagni2,4, and Alexander Horn1 — 1Laserinstitut Hochschule Mittweida, Hochschule Mittweida, Technikumplatz 17, 09648 Mittweida, Germany — 2Institut für Fertigungstechnik, Technische Universität Dresden, George-Bähr-Str. 3c, 01069 Dresden, Germany — 3Carl Zeiss SMT GmbH, Carl-Zeiss-Promenade 10, 07745 Jena, Germany — 4Fraunhofer-Institut für Werkstoff- und Strahltechnik IWS, Winterbergstr. 28, 01277 Dresden, Germany
Measuring the transient dielectric function of laser-excited surfaces by ultrafast optical metrology is crucial for understanding fundamental processes such as the absorption of laser radiation, the dynamics of the electron-phonon non-equilibrium, or material ablation. Thereby, the measured transient dielectric function always represents the sum of changes in the optical properties and topography. To distinguish between these two contributions, a combination of ultrafast ellipsometry and ultrafast interferometry enables solving this problem. To demonstrate the advantage of the combination of both methods, the transient changes in the dielectric function and the surface topography in terms of periodic oscillations due to the induced shock and rarefaction waves are exemplarily demonstrated for an excited thin gold film upon single-pulsed irradiation with ultrafast laser radiation (λ = 800 nm, τH = 40 fs) at a fluence of 50 % of the ablation threshold.
Keywords: Ultrafast Laser Radiation; Pump-Probe; Ulrafast Imaging Ellipsometry; Ultrafast Imaging Interferometry; Two-Temperature Model Hydrodynamics