Berlin 2008 – wissenschaftliches Programm
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DS: Fachverband Dünne Schichten
DS 35: Nanostructured block copolymer films (SYSA 8)
DS 35.3: Vortrag
Donnerstag, 28. Februar 2008, 17:45–18:00, H 2032
Creating nano-structured films from self-encapsulated inorganic-organic hybrid materials — J. Perlich1, M. Memesa2, J.S. Gutmann2, and •P. Müller-Buschbaum1 — 1TU München, Physik-Department LS E13, James-Franck-Str. 1, D-85748 Garching (Germany) — 2MPI for Polymer Research, Ackermannweg 10, D-55128 Mainz (Germany)
Inorganic-organic hybrid materials are used in many technological areas. Nano-structured films of these materials are of special interest for photo-volatic applications. Based on a sol-gel process and an amphiphilic diblock copolymer matrix metal oxide nano-structures are created. These nano-structures are transferred into thin films and result in highly ordered hybrid films. Key parameters with respect to structural control are the type of diblock copolymer and the detailed preparation conditions. After thin film preparation a calcinations process is added. Moreover the impact of plasma etching is investigated. We focus on the example of poly(styrene)-b-poly(ethylenoxide), P(S-b-EO), for the preparation of the TiO2 nano-composite films, a system which exhibits optical properties for photo-volatic applications. Nano-structures on simple Si substrates are compared with structures obtained on ITO-covered glass surfaces. Experimentally the investigation is based on grazing incidence small angle x-ray scattering (GISAXS) in combination with scanning probe microscopy (SPM) and scanning electron microscopy (SEM). Each step of the complex preparation process is monitored with these techniques allowing for a high degree of control.