Dresden 2009 –
wissenschaftliches Programm
DS 13: Thin Film Metrology for Electronics, Photonics, and Photovoltaics I
Dienstag, 24. März 2009, 10:30–12:00, GER 38
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10:30 |
DS 13.1 |
Topical Talk:
Metrologie der Mikro- und Nanostrukturen mittels Rastersondenmikroskopie — •Teodor Gotszalk
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11:00 |
DS 13.2 |
Utilizing near-field and depolarization effects for tip-enhanced Raman spectroscopy on semiconductor nanostructures — •Peter Hermann, Zhijiat Chong, Michael Hecker, Phillip Olk, Martin Weisheit, Jochen Rinderknecht, Yvonne Ritz, Peter Kücher, and Lukas M. Eng
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11:15 |
DS 13.3 |
Strain analysis of embedded SiGe structures by Raman spectroscopy and FEM modelling — •Marek Roelke, Michael Hecker, Yvonne Ritz, Ehrenfried Zschech, and Victor Vartanian
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11:30 |
DS 13.4 |
Electromigration simulation for on-chip Cu interconnects — •Matthias Kraatz, Dieter Schmeisser, Ehrenfried Zschech, and Paul S. Ho
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11:45 |
DS 13.5 |
Metrology of nano-thin films by use of atomic force acoustic microscopy — •Malgorzata Kopycinska-Müller, Andrey Striegler, Arnd Hürrich, Bernd Köhler, Norbert Meyendorf, and Klaus-Jürgen Wolter
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