Regensburg 2010 – wissenschaftliches Programm
Bereiche | Tage | Auswahl | Suche | Downloads | Hilfe
DS: Fachverband Dünne Schichten
DS 36: Thin Film Characterisation: Structure Analyse and Composition (XRD, TEM, XPS, SIMS, RBS, ...) I
DS 36.4: Vortrag
Donnerstag, 25. März 2010, 10:15–10:30, H8
RBS and resonant scattering analysis of thin oxidic films prepared by sputtering — •Dieter Mergel1, Hans-Werner Becker2, and Detlef Rogalla2 — 1Universität Duisburg-Essen, FB Physik, 47048 Duisburg — 2Ruhr-Universität Bochum, Dynamitron Tandem Labor des RUBION, 44780 Bochum
The oxygen content in various oxidic thin films has been determined from alpha scattering spectra based upon gauging with a rutile and a SrTiO3 crystal. Both RBS and scattering with the 3.04 MeV resonance (for O) were applied and compared to each other.
Main findings are:
- Gradient in O-content of TiO2 prepared by reactive magnetron sputtering at 300∘C at various oxygen partial pressures.
- Oxygen surplus in ITO films prepared by rf-diode sputtering.
- Variation in the oxygen content of nominal Cr2MnO4 prepared by magnetron sputtering at 350∘C to 650∘C.